Isipili seAluminiyam engaphakathi kweMagnetron yokuSputtering Line

Inkcazelo emfutshane:

I-Aluminium Mirror Inline yeMagnetron Sputtering Line yenzelwe ukukhutshwa okuphezulu kwenjongo yokwenziwa kwesipili seglasi.Ukuze unxibe iglasi enkulu kwaye ukhathalele ipaneli yeglasi ebuthathaka, ngakumbi kubukhulu bamashiti amakhulu, siqhele ukwenza uhlobo oluthe tye lomgca wokutshiza.Ingumgca oqhubekayo wokugquma wemagnetron, kunye negumbi lokumpompa elirhabaxa ngaphambili nangasemva, kwaye emva kwegumbi lenguqu, ngaphambi nasemva kwegumbi lokumpompa elilungileyo, igumbi le-buffer, igumbi lokufaka umbala.

Ithagethi d esign: icylindrical magnetron sputtering cathodes okanye/kunye neplanar cathodes.

Umthombo wamandla: unikezelo lwamandla ngamandla aphezulu eDC okanye iMF magnetron sputtering

Inkqubo yokuqhuba: i-roller drive, i-frequency adjustable, inkqubo yokuvula ucango lwegumbi lokungeniswa.

Inkqubo yokufunxa: impompo yokusasaza (okanye impompo ye-turbo molecular) + impompo yeengcambu + impompo yomatshini

Thumela i-imeyile kuthi

Iinkcukacha zeMveliso

Iithegi zeMveliso

Iimpawu eziphambili

I-Aluminium Mirror Inline ye-Magnetron Sputtering Line idla ngokuza kunye namagumbi amaninzi okucoca ukugqiba i-vacuum coating kumaphepha eglasi.
Iimpawu eziphambili:
1.Max.glass ubungakanani ukutyabeka:2440x3660mm okanye ngokwezifiso
2. Amagumbi amaninzi e-vacuum kunye noyilo lwegumbi le-multi-sputtering luyafumaneka
3. Umgca wokulawula umbane onqamlekileyo unesiphelo esisodwa kunye nesakhiwo esiphindwe kabini;iglasi yokucoca kabini, ukugquma, ukufumanisa, ukupeyinta, ukomisa, ukupholisa kunokugqitywa konke ngexesha elinye
4. Umgca we-sputtering coating usebenzisa i-PLC kulawulo lwenkqubo yonke kwaye ixhotyiswe ngesikrini sombala ukubonisa idatha yenkqubo yokugquma.

Uluhlu lweengubo: iTitanium, iChrome, iStainless Steel, iAluminiyam, iSilivere, iCopper, njl.

Umdibaniso: TiN, TiO2, njl.
Umaleko ubukhulu: 5-100nm
Ukudluliselwa: 8-40% kwi-380-780 nm wavelengths
Ubushushu bendawo: ubushushu begumbi

Uxinzelelo lokugqibela emva kwe-8 hr yokumpompa-phantsi:
Igumbi lokungena lokutshixa kunye negumbi lokutshixa i-vacuum: 5 × 10-1 Pa okanye ngaphantsi
Buffer Chamber 1 : 3×10-3 Pa okanye ngaphantsi
Sputtering Chamber: 2×10-3 Pa okanye ngaphantsi
Buffer Chamber 2 : 3×10-3 Pa okanye ngaphantsi
Phuma kwigumbi lokutshixa & igumbi lokutshixa ivacuum: 5×10-1 Pa okanye ngaphantsi