UMagetron Sputtering Machine
-
Vacuum obhityileyo film magnetron sputtering umatshini ukutyabeka
Isixhobo sokutshiza se-vacuum magnetron kukusetyenziswa kowasetyhini, umphezulu we-bipolar electrode kunye nommandla wemagnethi we-electron kwi-cathode surface drift, ngokuseta indawo ekujoliswe kuyo yombane ejikeleze umhlaba wemagnethi, i-electron yonyusa i-stroke, yonyusa izinga le-ionization. yerhasi, ngelixa amasuntswana aphezulu-eneji igesi kwaye ulahlekelwe amandla emva kongquzulwano kunye nobushushu substrate esezantsi, ukwambathisa ngokupheleleyo kwi impahla non-ubushushu ukumelana.
-
Inkqubo ye-vacuum deposition magnetron sputtering
Inkqubo yokutshiza yemagnetron yivacuum luhlobo lwesixhobo sokufunxa esinokuthi sisetyenziselwe ukusebenzisa umaleko obhityileyo wokugquma ifilim kwizinto ezahlukeneyo ezikrwada ezineentsimbi okanye ezisebenzayo.
-
Umatshini wokugquma weMagnetron wezinto zokugalela zeplastiki ezilahlwayo
I-Magnetron sputtering yitekhnoloji yokubekwa kwefilim esetyenziswa ngokubanzi ngoku.Ngophuhliso oluqhubekayo lwetekhnoloji ye-sputtering kunye nokuphononongwa kweefilimu ezintsha ezisebenzayo, ukusetyenziswa kwe-magnetron sputtering kuye kwandiswa kwiindawo ezininzi zemveliso kunye nophando lwezenzululwazi.Njengetekhnoloji yokwambathisa engeyiyo i-thermal kwintsimi ye-microelectronics, isetyenziswa ikakhulu kwi-chemical vapor deposition (CVD) okanye i-metal organic chemical vapor deposition (MOCVD) ukufaka iifilimu ezibhityileyo zemathiriyeli ekunzima ukuyikhulisa kwaye ayifanelekanga, kwaye inokufumaneka. iifilimu ezibhityileyo kakhulu ezifanayo kwiindawo ezinkulu.
